Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 01 processing: Difference between revisions
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==Mix-and-match== | ==Mix-and-match== | ||
In order to establish a mix-and-match process for Aligner: Maskless 01, different resists have been tested by exposing them in a mask aligner, and subsequently aligning and exposing using Aligner: Maskless 01. Screen dumps taken during the alignment procedure may be seen in the table below. | |||