Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 01 processing: Difference between revisions
| Line 140: | Line 140: | ||
| 6.44±2.33 | | 6.44±2.33 | ||
| -0.93±5.89 | | -0.93±5.89 | ||
|- | |||
|-style="background:WhiteSmoke; color:black" | |||
|rowspan="2"|2 alignment marks | |||
shifted +2µm in X | |||
|'''X''' | |||
|NA | |||
|rowspan="2"|NA | |||
| -0.25±0.15 | |||
| -0.26±0.11 | |||
| -1.33±2.33 | |||
| 5.28±1.67 | |||
|- | |||
|-style="background:WhiteSmoke; color:black" | |||
|'''Y''' | |||
| NA | |||
| -0.30±0.25 | |||
| -0.28±0.18 | |||
| -1.33±2.33 | |||
| 3.89±1.25 | |||
|} | |} | ||