Specific Process Knowledge/Thin film deposition/Deposition of Aluminium: Difference between revisions
| Line 75: | Line 75: | ||
|Depending on [[/Sputter rates for Al|process parameters]], up to ~2.5 Å/s | |Depending on [[/Sputter rates for Al|process parameters]], up to ~2.5 Å/s | ||
|~1.5Å/s to 2Å/s | |~1.5Å/s to 2Å/s | ||
| | |1 Å/s | ||
|- | |- | ||
|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||