Specific Process Knowledge/Etch/ASE (Advanced Silicon Etch): Difference between revisions
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|style="background:LightGrey; color:black"|Batch size | |style="background:LightGrey; color:black"|Batch size | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*1 6" wafer per run | *1 6" wafer per run (requires hardware change) | ||
*1 4" wafer per run | *1 4" wafer per run | ||
*1 2" wafer per run | *1 2" wafer per run (requires carrier) | ||
*Or several smaller pieces on a carrier wafer | *Or several smaller pieces on a carrier wafer | ||
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