Specific Process Knowledge/Characterization/Probe station: Difference between revisions

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-The purpose is to measure the thickness of wafers, depths of larger grooves or height of larger mesas.
+The Probe station is a - EPS150Triax - Cascade. The purpose is to measure I/V measurement, ohmic measurements etc, it has 4 individually adjustable triax connected probes, but can be fitted with additional coax connected.
-During a KOH etch it can be helpful to ensure no over-etching by making a thickness measurement during the etching.
+It has several source meters, multi meters and a computer attached.
 ==Equipment performance and process related parameters==