Specific Process Knowledge/Wafer cleaning/7-up & Piranha: Difference between revisions
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[[Image:7-up_RR3.jpg|300x300px|right|thumb|Fume hood 01 and 02 in cleanroom D3]] | [[Image:7-up_RR3.jpg|300x300px|right|thumb|Fume hood 01 and 02 in cleanroom D3]] | ||
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User manuals, risk assessments and contact information can be found on the equipment Info-pages in LabManager:<br> | |||
< | [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=383 Wafer Cleaning Info page in LabManager]<br>[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=382 Mask Cleaning Info page in LabManager] | ||
[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach= | <br>[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=368 Fume hood 01 Info page in LabManager] | ||
<br>[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=369 Fume hood 02 Info page in LabManager] | |||
===Comparing the 7-up cleans and Piranha clean=== | ===Comparing the 7-up cleans and Piranha clean=== | ||