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Specific Process Knowledge/Wafer cleaning/7-up & Piranha: Difference between revisions

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Always use one of these cleaning procedures after KOH etch or hot phosphoric acid etch (Nitride etch) to remove alkali ions before further processing. 7-up and Piranha are always used as cleaning solutions '''after''' stripping resist if you have resist on your samples. Cleaning samples with resist coatings or significant amounts of other organic substances can be very dangerous, because 7-Up and Piranha are so aggressive. '''These solutions are intended for removing TRACES of organic matter. Adding large amounts of organics can lead to explosive reactions!'''
Always use one of these cleaning procedures after KOH etch or hot phosphoric acid etch (Nitride etch) to remove alkali ions before further processing. 7-up and Piranha are always used as cleaning solutions '''after''' stripping resist if you have resist on your samples. Cleaning samples with resist coatings or significant amounts of other organic substances can be very dangerous, because 7-Up and Piranha are so aggressive. '''These solutions are intended for removing TRACES of organic matter. Adding large amounts of organics can lead to explosive reactions!'''


[[Image:7-up_RR3.jpg|300x300px|right|thumb|Wafer clean bath in cleanroom D3. <br\> -Up to 25 wafers of 4" or 6" at a time.<br\> -Materials allowed: Silicon, Poly Silicon, Silicon Oxide, Silicon Nitride, Silicon Oxynitride,Quartz/fused silica]]
[[Image:7-up_RR3.jpg|300x300px|right|thumb|'Wafer clean' bath in cleanroom D3]]
[[Image:7-up_Mask.jpg|300x300px|right|thumb|Mask clean in cleanroom D3:<br\> -Up to 25 glass wafers of 4" at a time or 4 masks.<br\> -Materials allowed: Silicon, Poly Silicon, Silicon Oxide, Silicon Nitride, Silicon Oxynitride, Quartz/fused silica, glass (Pyrex and Soda Lime), chromium]]
[[Image:7-up_Mask.jpg|300x300px|right|thumb|'Mask clean' bath in cleanroom D3]]
[[Image:7-up_RR3.jpg|300x300px|right|thumb|Fume hood 01 and 02 in cleanroom D3<br\> -Up to 19 wafers of 4" at a time.<br\> -Materials allowed: Silicon, Silicon oxide, Silicon nitride, PolySi]]
[[Image:7-up_RR3.jpg|300x300px|right|thumb|Fume hood 01 and 02 in cleanroom D3]]
 
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'''The user manual, user APV and contact information can be found in LabManager:'''
The user manual, user APV and contact information can be found in LabManager:
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[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=135 7-up 6" info page in LabManager] or [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=69 7-up (masks) info page in LabManager]
[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=135 7-up 6" info page in LabManager] or [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=69 7-up (masks) info page in LabManager]
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