LabAdviser/Courses: Difference between revisions

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 * Get acquainted with either Clewin 5 or L-edit mask design programs
-* construct basic mask structures (rectangles, polygons, circles etc.)
+* construct manipulate basic shapes (rectangles, polygons, circles etc.)
-* Be able to manipulate shapes in different ways (merge, intersect, XOR, subtract, invert, move, scale, rotate, mirror, grow/shrink, duplicate, align etc.)
+* use mask layers and hierarchical mask design
-* use mask layers for a process
-* organize a hierarchical mask design
 * choose mask polarity and orientation for different resist types and Front/Back-side alignment
-* discuss tolerances related to mask design/process flows
+* select and design appropriate test structures and alignment marks for a process
-* distinguish between critical/non-critical process/mask steps
-* design appropriate test structures for a process
-* select appropriate alignment marks for a process
 * make a chip/wafer layout usable for dicing
 * export the layout to cif or gds files with appropriate layer names