Specific Process Knowledge/Thin film deposition/PECVD: Difference between revisions
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PECVD is a chemical vapor deposition process that applies a plasma to enhance chemical reaction rates of reactive spices. PECVD processing allows deposition at lower temperatures, which is often critical in the manufacture of semiconductors. | PECVD is a chemical vapor deposition process that applies a plasma to enhance chemical reaction rates of reactive spices. PECVD processing allows deposition at lower temperatures, which is often critical in the manufacture of semiconductors. | ||
All though PECVD1, 2 and 3 are very similar you should not expect to transfer a recipe between the systems and get the | All though PECVD1, 2 and 3 are very similar you should not expect to transfer a recipe between the systems and get the exact same result. | ||
== Recipes on PECVD1 and PECVD3 == | == Recipes on PECVD1 and PECVD3 == | ||