Specific Process Knowledge/Thin film deposition/Wordentec: Difference between revisions
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*Thermal evaporation | *Thermal evaporation | ||
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!style="background:silver; color:black" align="left" rowspan="2"|Performance | !style="background:silver; color:black" align="left" rowspan="2" valign="top" |Performance | ||
|style="background:LightGrey; color:black"|Film thickness | |style="background:LightGrey; color:black"|Film thickness | ||
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*~2.5Å/s - 15Å/s | *~2.5Å/s - 15Å/s | ||
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!style="background:silver; color:black" align="left" rowspan= "2"|Process parameter range | !style="background:silver; color:black" align="left" rowspan= "2" valign="top" |Process parameter range | ||
|style="background:LightGrey; color:black"|Process Temperature | |style="background:LightGrey; color:black"|Process Temperature | ||
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*~3x10<sup>-7</sup> - 4x10<sup>-6</sup> mbar | *~3x10<sup>-7</sup> - 4x10<sup>-6</sup> mbar | ||
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!style="background:silver; color:black" align="left" rowspan="3"|Substrates | !style="background:silver; color:black" align="left" rowspan="3" valign="top" |Substrates | ||
|style="background:LightGrey; color:black"|Batch size | |style="background:LightGrey; color:black"|Batch size | ||
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Revision as of 14:53, 7 May 2008
Wordentec QCL 800
The Wordentec is a machine for:
- Deposition of metal through E-beam deposition
- Deposition of metal through thermal evaporation
- Deposition of materials through DC sputtering
- Cleaning of samples before deposition through Argon RF sputter clean
The Wordentec is designed to deposit on 1-6 samples in sequence, samples of a size up to 6" in diameter. Adaptors exist for deposition on 2", 4" and 6" wafers, but deposition is possible on samples of almost any size and shape, as long as they do not exceed the size of a 6" substrate. The Wordentec supports either single sample deposition on each sample or batch deposition on six wafers in sequence. It is possible to freely combine processes from the machines different sources.
Process information
The metals available for E-beam evaporation and their standard deposition rates are:
| Metal | Deposition rate [Å/s] |
|---|---|
| Titanium (Ti) | 10 |
| Chromium (Cr) | 10 |
| Aluminium (Al) | 10 |
| Nickel (Ni) | 10 |
| Platinum (Pt) | 10 |
| Gold (Au) | 10 |
Thermal evaporation materials
We currently only have Aluminium available to deposit through thermal evaporation
Sputter materials
It is possible to sputter deposit almost any material, provided that it is possible to deposit with DC sputtering. The materials available currently are:
- TiW alloy (10%/90% by weight)
- Aluminium (Al)
- Chromium (Cr)
- Titanium (Ti)
| Purpose | Deposition of metals| |
|
|---|---|---|
| Performance | Film thickness |
|
| Deposition rate |
| |
| Process parameter range | Process Temperature |
|
| Process pressure |
| |
| Substrates | Batch size |
|
| Substrate material allowed |
| |
| Material allowed on the substrate |
|