Specific Process Knowledge/Characterization/XPS/Carbon contamination: Difference between revisions
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==Carbon Contamination== | ==Carbon Contamination== | ||
--[[User:Kare|kare]] ([[User talk:Kare|talk]]) 09:29, 18 February 2015 | --[[User:Kare|kare]] ([[User talk:Kare|talk]]) 09:29, 18 February 2015 | ||
An unexpected carbon signal is often found in samples during XPS. The carbon typically originates from sample exposure to the air outside the XPS (e.g. the lab). Measurements of carbon contamination of a sputter cleaned Cu sample due to air exposure indicates that carbon contamination builds up to 20 At. % in approximately one minute. | An unexpected carbon signal is often found in samples during XPS. The carbon typically originates from sample exposure to the air outside the XPS (e.g. the lab). Measurements of carbon contamination of a sputter cleaned Cu sample due to air exposure indicates that carbon contamination builds up to 20 At. % in approximately one minute. | ||