Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/SOI/SOI: Difference between revisions
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| Line 23: | Line 23: | ||
| Pegasus/jmli | | Pegasus/jmli | ||
| 10 minute TDESC clean | | 10 minute TDESC clean | ||
| | | nanolab/jml/showerhead/SOI/SOI, 96 cyc or 8:00 mins | ||
| S004745 | | S004745 | ||
! New showerhead | ! New showerhead | ||
Revision as of 22:27, 25 November 2019
| Date | Substrate Information | Process Information | SEM Images | ||||||
|---|---|---|---|---|---|---|---|---|---|
| Wafer info | Mask | Material/ Exposed area | Tool / Operator | Conditioning | Recipe | Wafer ID | Comments | ||
| 15/12-2014 | 4" Wafer with travka65 mask | AZ standard | Si / 65 % | Pegasus/jmli | 10 minute TDESC clean | nanolab/jml/showerhead/SOI/SOI, 96 cyc or 8:00 mins | S004745 | New showerhead |
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