Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/ProcessD/PrD-4: Difference between revisions
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| Pegasus/jmli | | Pegasus/jmli | ||
| s004781 | | s004781 | ||
| | | nanolab/jml/showerhead/prD/PrD-4, 150 cyc or 8:00 mins | ||
| S004782 | | S004782 | ||
! New showerhead | ! New showerhead |
Revision as of 21:28, 25 November 2019
Date | Substrate Information | Process Information | SEM Images | ||||||
---|---|---|---|---|---|---|---|---|---|
Wafer info | Mask | Material/ Exposed area | Tool / Operator | Conditioning | Recipe | Wafer ID | Comments | ||
8/1-2015 | 4" Wafer with travkaXX mask | AZ standard | Si / XX % | Pegasus/jmli | s004781 | nanolab/jml/showerhead/prD/PrD-4, 150 cyc or 8:00 mins | S004782 | New showerhead |