Specific Process Knowledge/Thin film deposition/Deposition of Silicon Nitride: Difference between revisions
Appearance
| Line 122: | Line 122: | ||
!Batch size | !Batch size | ||
| | | | ||
*1-25 100 mm wafers | *1-15 100 mm wafers (4" furnace), 1-25 100 mm wafers (6" furnace) | ||
*1-25 150 mm wafers (only 6" furnace) | *1-25 150 mm wafers (only 6" furnace) | ||
| | | | ||