Specific Process Knowledge/Thin film deposition/Deposition of Silicon Nitride: Difference between revisions
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*Silicon rich (low stress) nitride: ~5 nm - ~335 nm | *Silicon rich (low stress) nitride: ~5 nm - ~335 nm | ||
Thicker nitride layers can be deposited over more runs (maximum two) | Thicker nitride layers can be deposited over more runs (maximum two) | ||
Results from June 2017 | |||
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*~40 nm - 10 µm | *~40 nm - 10 µm | ||