Specific Process Knowledge/Thin film deposition/Deposition of Titanium Nitride: Difference between revisions
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Thin films of titanium nitride can only be deposited in the [[Specific Process Knowledge/Thin film deposition/ALD2 (PEALD)|ALD2]] at the moment. More information about the process can be found [[Specific Process Knowledge/Thin film deposition/ALD2 (PEALD)/TiN deposition using ALD2|here]]. | Thin films of titanium nitride can only be deposited in the [[Specific Process Knowledge/Thin film deposition/ALD2 (PEALD)|ALD2]] at the moment. More information about the process can be found [[Specific Process Knowledge/Thin film deposition/ALD2 (PEALD)/TiN deposition using ALD2|here]]. | ||
==Only method at the moment for the deposition of titanium nitride== | ==Only method at the moment for the deposition of titanium nitride.== | ||
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Revision as of 17:11, 3 March 2020
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Deposition of Titanium nitride
Thin films of titanium nitride can only be deposited in the ALD2 at the moment. More information about the process can be found here.
Only method at the moment for the deposition of titanium nitride.
ALD2 | |
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Generel description |
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Stoichiometry |
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Film Thickness |
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Deposition rate |
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Step coverage |
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Process Temperature |
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Substrate size |
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Allowed materials |
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