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Specific Process Knowledge/Thin film deposition/PECVD: Difference between revisions

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==A rough overview of the performance of PECVD thin films and some process related parameters==
==Overview of the performance of PECVD thin films and some process related parameters==


{| border="2" cellspacing="0" cellpadding="10"  
{| border="2" cellspacing="0" cellpadding="10"  
|-
|-
!style="background:silver; color:black;" align="left"|Purpose  
!style="background:silver; color:black;" align="left"|Purpose  
|style="background:LightGrey; color:black"|Deposition of dielectrica |
|style="background:LightGrey; color:black"|Deposition of dielectrica  
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*Silicon oxide
*Silicon oxide
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|-
|-
!style="background:silver; color:black" align="left"|Performance
!style="background:silver; color:black" align="left"|Performance
|style="background:LightGrey; color:black"|Film thickness||style="background:WhiteSmoke; color:black"|
|style="background:LightGrey; color:black"|Film thickness
|style="background:WhiteSmoke; color:black"|
*~10nm - 30µm
*~10nm - 30µm
|-
|-
|style="background:silver; color:black" |.||style="background:LightGrey; color:black"|Index of refraction||style="background:WhiteSmoke; color:black"|
|style="background:silver; color:black" |
|style="background:LightGrey; color:black"|Index of refraction
|style="background:WhiteSmoke; color:black"|
*~1.4-2.1
*~1.4-2.1
|-
|-
|style="background:silver; color:black"|.||style="background:LightGrey; color:black"|Step coverage
|style="background:silver; color:black"|
|style="background:LightGrey; color:black"|Step coverage
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*In general: Not so good
*In general: Not so good
*PBSG: Floats at 1000<sup>o</sup>C
*PBSG: Floats at 1000<sup>o</sup>C
|-
|-
|style="background:silver; color:black"|.||style="background:LightGrey; color:black"|Film quality
|style="background:silver; color:black"|
|style="background:LightGrey; color:black"|Film quality
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*Not so dense film
*Not so dense film
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*300 <sup>o</sup>C
*300 <sup>o</sup>C
|-
|-
|style="background:silver; color:black"|.||style="background:LightGrey; color:black"|Process pressure
|style="background:silver; color:black"|
|style="background:LightGrey; color:black"|Process pressure
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*~200-900 mTorr
*~200-900 mTorr
|-
|-
|style="background:silver; color:black"|.||style="background:LightGrey; color:black"|Gas flows
|style="background:silver; color:black"|
|style="background:LightGrey; color:black"|Gas flows
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*SiH<math>_4</math>:0-60 sccm
*SiH<math>_4</math>:0-60 sccm
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*Deposition on one side of the substrate
*Deposition on one side of the substrate
|-
|-
|style="background:silver; color:black"|.|| style="background:LightGrey; color:black"|Substrate material allowed
|style="background:silver; color:black"|
| style="background:LightGrey; color:black"|Substrate material allowed
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*Silicon wafers
*Silicon wafers
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*Quartz wafers  
*Quartz wafers  
|-  
|-  
|style="background:silver; color:black"|.|| style="background:LightGrey; color:black"|Material allowed on the substrate
|style="background:silver; color:black"|
| style="background:LightGrey; color:black"|Material allowed on the substrate
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*Aluminium
*Aluminium