Specific Process Knowledge/Thin film deposition/Deposition of Gold: Difference between revisions
Appearance
No edit summary |
No edit summary |
||
| Line 176: | Line 176: | ||
== Thin Au layer deposition using Lesker== | == Thin Au layer deposition using Lesker== | ||
For depositing very thin, down to 6nm continuous Au layers on Si/SiO<sub>2</sub> substrates. Works also with ALD deposited Al<sub>2</sub>O<sub>3</sub> and TiO<sub>2</sub> as substrate. | For depositing very thin, down to 6nm continuous Au layers on Si/SiO<sub>2</sub> substrates. Works also with ALD deposited Al<sub>2</sub>O<sub>3</sub> and TiO<sub>2</sub> as substrate. | ||