Specific Process Knowledge/Wafer cleaning/IMEC: Difference between revisions
| Line 37: | Line 37: | ||
|2 | |2 | ||
|Piranha | |Piranha | ||
|Mixture: H<sub>2</sub>SO<sub>4</sub>:H<sub>2</sub>O<sub>2</sub> (4:1) | |Mixture: H<sub>2</sub>SO<sub>4</sub>:H<sub>2</sub>O<sub>2</sub> (4:1)<br> | ||
Temp: 80<sup>o</sup>C | Temp: 80<sup>o</sup>C<br> | ||
Time: 5 min | Time: 5 min | ||
|You can use the 'Mask Clean' bath in Wet Bench 04 (in cleanroom D-3). <b>However, this requires planning at least a couple of days in advance, since the bath is primarily used for other purposes!</b>. Alternatively use a very clean glass beaker. The recommended procedure is: | |You can use the 'Mask Clean' bath in Wet Bench 04 (in cleanroom D-3). <b>However, this requires planning at least a couple of days in advance, since the bath is primarily used for other purposes!</b>. Alternatively use a very clean glass beaker. The recommended procedure is: | ||
*Pour H<sub>2</sub>SO<sub>4</sub> into bath/beaker | *Pour H<sub>2</sub>SO<sub>4</sub> into bath/beaker | ||
| Line 56: | Line 55: | ||
|4 | |4 | ||
|IMEC | |IMEC | ||
|Mixture: DI water:5% HF:Isopropanol (100:10:1) | |Mixture: DI water:5% HF:Isopropanol (100:10:1)<br> | ||
Temp: 25 <sup>o</sup>C | Temp: 25<sup>o</sup>C<br> | ||
Time: 100 sec | Time: 100 sec | ||
|<b>Make an appointment some days in advance with a Danchip employee to help you with this step!</b> | |<b>Make an appointment some days in advance with a Danchip employee to help you with this step!</b> | ||
*Clean tank (Cleanroom D-3, the 'Optional Bath' inside Wet Bench 05: Al etch) | *Clean tank (Cleanroom D-3, the 'Optional Bath' inside Wet Bench 05: Al etch) | ||
| Line 78: | Line 76: | ||
|Not nitride wafers! | |Not nitride wafers! | ||
Mixture: H<sub>2</sub>SO<sub>4</sub>:H<sub>2</sub>O<sub>2</sub> (4:1) | Mixture: H<sub>2</sub>SO<sub>4</sub>:H<sub>2</sub>O<sub>2</sub> (4:1) | ||
Temp: 80 <sup>o</sup>C | Temp: 80<sup>o</sup>C<br> | ||
Time: 20 min | Time: 20 min<br> | ||
|Re-use previous piranha | |Re-use previous piranha | ||