Specific Process Knowledge/Wafer cleaning/IMEC: Difference between revisions
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'''Information about | '''Information about equipment relevant to this procedure can be found in LabManager:'''<br> | ||
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Info page for '[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=368 Fume hood 01: Acids/bases]'<br> | |||
Info page for '[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=369 Fume hood 02: Acids/bases]'<br> | |||
Info page for '[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=411 Wet bench 03: Wafer and mask cleaning]'<br> | |||
Info page for '[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=413 Wet bench 05: Al etch]'<br> | |||
Info page for '[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=383 Wafer Cleaning]'<br> | |||
Info page for '[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=380 <i>Optional Bath</i> <b>(Currently not in operation!)</b>]'<br> | |||