Specific Process Knowledge/Etch/Wet Polysilicon Etch: Difference between revisions
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==Wet PolySi Etch== | ==Wet PolySi Etch== | ||
[[Image:polyetch1.jpg|300x300px|thumb|Wet Poly Etch: Positioned in cleanroom D-3 to the left in the bench]] | |||
The wet PolySi Etch is an isotropic silicon etch. This holds for both a poly-silicon thin-film as well as single-crystalline material such as a Si(100) surface. The PolySi Etch process is placed in a dedicated PP-tank in a laminar-flow bench in cleanroom D. | The wet PolySi Etch is an isotropic silicon etch. This holds for both a poly-silicon thin-film as well as single-crystalline material such as a Si(100) surface. The PolySi Etch process is placed in a dedicated PP-tank in a laminar-flow bench in cleanroom D. | ||