Specific Process Knowledge/Wafer cleaning/IMEC: Difference between revisions
| Line 29: | Line 29: | ||
*Takes approximately 1,5 hours | *Takes approximately 1,5 hours | ||
*Orient flat to minimize handling | *Orient flat to minimize handling | ||
* | *Preferably do the cleaning just before bonding to maintain cleanliness! | ||
|Get CLEAN box for wafers!!! | |Get CLEAN box for wafers!!! | ||
|- | |- | ||
| Line 38: | Line 38: | ||
Time: 5 min | Time: 5 min | ||
(a yellow and a black spot) | (a yellow and a black spot) | ||
|You can use the 'Mask Clean' bath in Wet Bench 04 (in cleanroom D-3). <b>However, this requires planning at least a couple of days in advance, since the bath is primarily used for other purposes!</b>. Alternatively use a very clean glass beaker. | |You can use the 'Mask Clean' bath in Wet Bench 04 (in cleanroom D-3). <b>However, this requires planning at least a couple of days in advance, since the bath is primarily used for other purposes!</b>. Alternatively use a very clean glass beaker. The recommended procedure is: | ||
Pour | *Pour H<sub>2</sub>SO<sub>4</sub> into bath/beaker | ||
*Place wafers in clean carrier (USE this in steps 2-7) | |||
*Add H<sub>2</sub>O<sub>2</sub> to the beaker that already contains H<sub>2</sub>SO<sub>4</sub> | |||
*Wait 30 sec to ensure mixing of chemicals, then dip wafers. | |||
|Maybe clean the tank the day before! | |Maybe clean the tank the day before! | ||
|- | |- | ||
| Line 45: | Line 48: | ||
|Rinse | |Rinse | ||
|2 min. rinse | |2 min. rinse | ||
|. | |Rinse you wafers with DI-water. | ||
|Put into dedicated wet box for IMEC | |Put into dedicated wet box for IMEC | ||
|- | |- | ||
|4 | |4 | ||
|IMEC | |IMEC | ||
|DI water:5% HF: | |Mixture: DI water:5% HF:Isopropanol (100:10:1) | ||
Temp: 25 <sup>o</sup>C | Temp: 25 <sup>o</sup>C | ||
Time: 100 sec | Time: 100 sec | ||
(two black spots) | (two black spots) | ||
|Clean tank ( | |<b>Make an appointment some days in advance with a Danchip employee to help you with this step!</b> | ||
*Clean tank (Cleanroom D-3, the 'Optional Bath' inside Wet Bench 05: Al etch) | |||
*Mix your IMEC solution in dedicated bottle (IMEC) inside a fume hood | |||
*Ask a Danchip employee to help you filling the solution into the 'Optional Bath' tank! | |||
| | | | ||
. | . | ||