Specific Process Knowledge/Characterization: Difference between revisions
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*[[/AFM: Atomic Force Microscopy#Nanoman|Nanoman - ''AFM'']] | *[[/AFM: Atomic Force Microscopy#Nanoman|Nanoman - ''AFM'']] | ||
===[[/Profiler|Profiler]] | ===[[/Profiler|Profiler]]=== | ||
*[[/Profiler#Dektak _8 stylus _profiler|Dektak 8 stylus profiler]] | *[[/Profiler#Dektak _8 stylus _profiler|Dektak 8 stylus profiler]] | ||
Revision as of 07:22, 29 August 2008
Choose topic
- Sample imaging
- Topographic measurement
- Stress measurement
- Measurement of film thickness and optical constants
- Wafer thickness measurement - writer: Yvonne
- Element analysis
- Hydrophobicity measurement - writer: Jonas
- Resistivity measurement - writer: Jan
- Other electrical measurements - writer: Jan