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Specific Process Knowledge/Lithography/Coaters: Difference between revisions

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*1 syringe, which can be used for various resists.
*1 syringe, which can be used for various resists.


The 4"/6" coater station is equipped with 3 different resists lines:  
The 4"/6" coater station is equipped with 4 different resists lines:  
*AR-P 6200.09 (CSAR)
*AR-P 6200.09 (CSAR)
*AZ 5214E
*AZ 5214E
*AZ 4562
*AZ MiR 701   
*AZ MiR 701   


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{| border="2" cellspacing="0" cellpadding="2"  
{| border="2" cellspacing="0" cellpadding="2"  


!style="background:silver; color:black;" align="center" width="60"|Purpose  
!style="background:silver; color:black;" align="center" width="60"|Purpose  
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|style="background:WhiteSmoke; color:black"|
*HMDS priming
*HMDS priming
*Spin coating of anisole based E-beam resists
*Spin coating of PGMEA based UV resists
*Spin coating of PGMEA based UV resists
*Spin coating of E-beam resists <sup>1)</sup>
*Soft baking  
*Soft baking  
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|-
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|style="background:LightGrey; color:black"|
|style="background:LightGrey; color:black"|
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
* AZ MiR 701 (29cps)
* AR-P 6200.09 (CSAR)
* AZ nLOF 2020
* AZ 5214E
* AZ 5214E
* 100cc syringe dispense
' AZ 4562 ''4"/6" only''
* AZ MiR 701 (29cps) ''4"/6" only''
* 30cc syringe dispense ''2" only''
|-
|-
!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Performance
!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Performance
|style="background:LightGrey; color:black"|HMDS contact angle
|style="background:LightGrey; color:black"|HMDS contact angle
|style="background:WhiteSmoke; color:black" align="center"|
|style="background:WhiteSmoke; color:black" align="center"|
60 - 80°
60 - 80° (on Silicon)
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|-
|style="background:LightGrey; color:black"|Coating thickness
|style="background:LightGrey; color:black"|Coating thickness
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
* AR-P 6200.09 (CSAR):
* AZ 5214E: 1.5-5 µm
* AZ MiR 701: 1.5-4 µm
* AZ MiR 701: 1.5-4 µm
* AZ nLOF 2020: 1.5-5 µm
* AZ 5214E: 1.5-5 µm
* AZ 4562: 5-15 µm
* AZ 4562: 5-15 µm
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|style="background:LightGrey; color:black"|Substrate size
|style="background:LightGrey; color:black"|Substrate size
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
* 50 mm wafers <sup>1)</sup>
* 50 mm wafers
* 100 mm wafers
* 100 mm wafers
* 150 mm wafers
* 150 mm wafers
* 200 mm wafers <sup>1)</sup>
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|-
| style="background:LightGrey; color:black"|Allowed materials
| style="background:LightGrey; color:black"|Allowed materials
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<sup>1)</sup> Requires tool change.


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