LabAdviser/Technology Research/Fabrication of Hyperbolic Metamaterials using Atomic Layer Deposition/AZO gratings: Difference between revisions
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|Plasma surface treatment | |Plasma surface treatment | ||
|To ensure clean surface, the 100 mm Si wafer is treated by O<sub>2</sub>/N<sub>2</sub> plasma. (Optional step) | |To ensure clean surface, the 100 mm Si wafer is treated by O<sub>2</sub>/N<sub>2</sub> plasma. (Optional step) | ||
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[[Specific_Process_Knowledge/Lithography/Strip#Plasma_Asher_2| Plasma Asher 2]] | [[Specific_Process_Knowledge/Lithography/Strip#Plasma_Asher_2| Plasma Asher 2]] | ||
<br clear="all" /> | <br clear="all" /> | ||
[[Specific_Process_Knowledge/Lithography/Strip#Plasma_asher| Plasma Asher 1]] | [[Specific_Process_Knowledge/Lithography/Strip#Plasma_asher| Plasma Asher 1]] | ||
<br clear="all" /> | <br clear="all" /> | ||
|[[image:00_zero (1)_nanogratings.JPG|250x350px|center|]] | |[[image:00_zero (1)_nanogratings.JPG|250x350px|center|]] | ||
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