Specific Process Knowledge/Thin film deposition/Deposition of Palladium: Difference between revisions
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Palladium can be deposited by e-beam evaporation. In the chart below you can compare the different deposition equipment | Palladium can be deposited by e-beam evaporation. In the chart below you can compare the different deposition equipment: | ||
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! | ! | ||
! E-beam evaporation ([[Specific Process Knowledge/Thin film deposition/ | ! E-beam evaporation ([[Specific Process Knowledge/Thin film deposition/Temescal|Temescal]]) | ||
! E-beam evaporation ([[Specific Process Knowledge/Thin film deposition/Physimeca|Physimeca]]) | ! E-beam evaporation ([[Specific Process Knowledge/Thin film deposition/Physimeca|Physimeca]]) | ||
|- | |- | ||
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|-style="background:Lightgrey; color:black" | |-style="background:Lightgrey; color:black" | ||
! Pre-clean | ! Pre-clean | ||
| | |Ar ion source | ||
|RF Ar clean | |RF Ar clean | ||
|- | |- | ||
|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
! Layer thickness | ! Layer thickness | ||
| | |10 Å - 1 µm* | ||
| | |10 Å to 200 nm | ||
|- | |- | ||
|-style="background:Lightgrey; color:black" | |-style="background:Lightgrey; color:black" | ||
! Deposition rate | ! Deposition rate | ||
| | |0.5 Å/s to 10Å/s | ||
| | |2 Å/s to 10Å/s | ||
|- | |- | ||
|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
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! Batch size | ! Batch size | ||
| | | | ||
*Up to | *Up to 4x6" wafers | ||
*smaller pieces | *Up to 3x8" wafers (ask for holder) | ||
*smaller wafers and pieces | |||
| | | | ||
*1x 2" wafer or | *1x 2" wafer or | ||
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!Allowed materials | !Allowed materials | ||
| | | | ||
* Silicon oxide | *Silicon oxide | ||
* Silicon (oxy)nitride | *Silicon (oxy)nitride | ||
* Photoresist | *Photoresist | ||
* PMMA | *PMMA | ||
* Mylar | *Mylar | ||
* | *Metals | ||
* | *See also the [http://labmanager.dtu.dk/function.php?module=XcMachineaction&view=edit&MachID=429 cross-contamination sheet] | ||
| | | | ||
* Silicon oxide | * Silicon oxide | ||
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|} | |} | ||
'''*''' '' | '''*''' ''If depositing more than 600 nm, please write to metal@danchip.dtu.dk well in advance to ensure that enough material is present.'' | ||