*All chemicals to be spray coated must be approved specifically for spray coating
*All chemicals to be spray coated must be approved specifically for spray coating
*Any non-toxic, non-particulate and non-crosslinking material is likely to be approved
*Any non-toxic, non-particulate and non-crosslinking material is likely to be approved
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==SSE Spinner==
[[Image:SSEspinner2.jpg|350px|thumb|right|The SSE spinner MAXIMUS: positioned in E-5]]
'''Feedback to this section''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Coaters#SSE_Spinner click here]'''
SSE Spinner, Maximus 804, SSE Sister Semiconductor Equipment is a resist spinning system at Danchip which can be used for spinning on 2", 4" and 6" substrates.
The system is equipped with 2 different resists lines:
*AZ 5214E
*AZ 4562
and
*2 syringe lines, which can be used for spinning of e-beam resist.
'''The user manual, user APV, and contact information can be found in [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=188 LabManager]'''
===Process information===
The typical flow for resist spinning is divided in 3 steps: video, spinning and soft bake.
You need to create a separate recipe for each station and then collect the recipes in a flow. For the video station we have 3 standard recipes for 3 different wafer sizes: 2inch, 4inch, 6inch. To create a recipe for the coater station you need to describe spinning sequence using the predefined functions. Then you create recipe for the hotplates. After all recipes are created they can be set together in the different flows. It is why we are not recommending the user just change some parameters in the recipe, this change can effect some other flows.
*[[Specific Process Knowledge/Lithography/Coaters/General SSE spinner process information|General SSE spinner process information]]
*[[Specific Process Knowledge/Lithography/Coaters/SSE Spinner AZ5214e coating|AZ5214E coating on SSE Spinner]]
''Flow names, process parameters, and test results:''
*'''_DCH_100mm_AZ5214E_1,5um'''
Spin-off: 10 s at 2300 rpm closed followed by 10s at 3500 rpm open.
Spin Track 1 + 2 is an SVG 88 series track system from Rite Track. Each track consists of a HMDS priming module, a spin coating module, and a baking module. In fact, the only difference between the two tracks is the resist used in the spin coating module. Spin Track 1 + 2 is capable of handling 150 mm wafers, as well as 100 mm wafers, but is currently set up for 100 mm wafer processing.
The Spin Track 1 + 2 is controlled using the Recipe Manager software via the touchscreen on the arm attached to the lefthand end of the track. Recipes for the individual modules are developed by Danchip and combined into flows. The user selects a flow (specific to track 1 or 2), and the appropriate recipes will be downloaded and executed on the appropriate track. The other track runs an empty process (no wafers needed), and can unfortunately not be used by a second user while the first user is processing.
The user manual, user APV, and contact information can be found in LabManager
Spin Coater: Gamma UV was installed at Danchip in March 2015. It is a Gamma 2M cluster from Süss MicroTec with spin coating, vapour priming, and baking modules. The system handles 4" and 6" wafers without size conversion, and can be set up to handle 2" or 8".
The coater is equipped with 3 different resists lines:
AZ MiR 701
AZ nLOF 2020
AZ 5214E
and
1 syringe, which can be used for various resists.
The processes that are available on the system are developed by Danchip. Upon request, it is possible to establish new processes. Use of the syringe requires special training, and would as a starting point require batches in excess of 20 wafers.
Spin Coater: RCD8 is a model RCD8 T spin coater from Süss MicroTec with a motorized media arm and Gyrset functionality. It's primary purpose is spin coating of SU-8 resist. However, due to the possibility of using a non-vacuum chuck, the spin coater is also suitable for coating of substrates with e.g. textured backsides or membranes.
The user manual, user APV, and contact information can be found in LabManager
