Specific Process Knowledge/Etch/KOH Etch: Difference between revisions
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!colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment | !colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment | ||
|style="background:WhiteSmoke; color:black"|<b>KOH3</b> | |||
|style="background:WhiteSmoke; color:black"|<b>KOH2</b> | |style="background:WhiteSmoke; color:black"|<b>KOH2</b> | ||
|style="background:WhiteSmoke; color:black"|<b>KOH1</b> | |style="background:WhiteSmoke; color:black"|<b>KOH1</b> | ||
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|style="background:LightGrey; color:black"|Wet etch of Silicon | |style="background:LightGrey; color:black"|Wet etch of Silicon | ||
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*Etch of Silicon in 28 wt% KOH | |||
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*Etch of Silicon in 28 wt% KOH | *Etch of Silicon in 28 wt% KOH | ||