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Specific Process Knowledge/Etch/Wet Silicon Oxide Etch (BHF): Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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Mbec (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
186 edits
Line 255: Line 255:
!Size of substrate
!Size of substrate
|2"-6" wafers
|2"-6" wafers
|2"- 6" wafers or any that fits in a dedicated holder
|2"- 4" wafers or any that fits in a dedicated holder
|2"- 4" wafers or any that fits in a dedicated holder
|2"- 4" wafers or any that fits in a dedicated holder
|-
|-
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