Specific Process Knowledge/Thin film deposition/MVD: Difference between revisions
| Line 95: | Line 95: | ||
|+'''The STAMP recipe''' | |+'''The STAMP recipe''' | ||
|- | |- | ||
! rowspan="3" align="center"| O<sub>2</sub> plasma | ! rowspan="3" align="center"| O<sub>2</sub> plasma | ||
! Flow | ! Flow | ||
| Line 106: | Line 105: | ||
| 300 seconds | | 300 seconds | ||
|- | |- | ||
! rowspan="10" align="center"| Repeated 4 times | |||
! rowspan="4" align="center"| Chemical # 1 (vapor order 1) | ! rowspan="4" align="center"| Chemical # 1 (vapor order 1) | ||
! Name | ! Name | ||