Specific Process Knowledge/Characterization/SEM LEO

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SEM LEO

The SEM LEO located in cleanroom F-2

The SEM LEO is a scanning electron microscope. It is a very reliable and rugged instrument that provides high quality SEM images of most samples, and it has excellently served the users of the cleanroom for many years. Excellent images on a large variety of materials such as semiconductors, semiconductor oxides or nitrides, metals, thin films and some polymers may be acquired on the SEM.

However, the SEM LEO has now been equipped with a Raith e-beam lithography system, and from the turn of the year 2015-2016 it is exclusively dedicated to the users of the Raith E-beam lithography, so general imaging of user samples is no longer allowed.

The SEM LEO is located in the cleanroom. It was installed in 1998, and the software was ungraded in 2012.

The user manual, control instruction, the user APV and contact information can be found in LabManager:

SEM LEO info page in LabManager,

Performance information

• SEM comparison page

• Raith Elphy e-beam lithography system

Typical current values for EBL

Reported values are the average of five measurements from Elphy Quantum using the EBL holder's Faraday cup. All values in pA.

LEO - Current measurements 11/02/2017
	5kV	10kV	15kV	20kV
10um	13	17	20.5	25
20um	62	87	105	127
30um	160	175	215	264
60um	510	680	850	1040

Equipment performance

Equipment		SEM LEO (Leo 1550 SEM)
Purpose	Imaging and measurement of	Conducting samples Semi-conducting samples Thin (~ 5 µm <) layers of non-conducting materials such as polymers
	Other purpose	E-beam lithography using Raith Elphy Quantum system
Location		Cleanroom of DTU Danchip
Performance	Resolution	~ 5 nm (limited by vibrations) The resolution is strongly dependent on the type of sample and the skills of the operator.
Instrument specifics	Detectors	Secondary electron (Se2) Inlens secondary electron (Inlens) Backscatter electron (BSD)
	Stage	X, Y: 125 × 100 mm T: 0 to 90o R: 360o Z: 48 mm
	Electron source	FEG (Field Emission Gun) source
	Operating pressures	Fixed at High vacuum (2 × 10-5mbar - 10-6mbar)
	Options	Raith Elphy Quantum E-Beam Litography system
Substrates	Batch size	Wafers up to 6" (only full view up to 4")
	Allowed materials	Any standard cleanroom materials.