Specific Process Knowledge/Characterization/SEM LEO: Difference between revisions
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*[[Specific Process Knowledge/Lithography/EBeamLithography/RaithElphy|Raith Elphy e-beam lithography system]] | *[[Specific Process Knowledge/Lithography/EBeamLithography/RaithElphy|Raith Elphy e-beam lithography system]] | ||
===Typical current values=== | ===Typical current values for EBL=== | ||
Reported values are the average of five measurements from Elphy Quantum using the EBL holder's Faraday cup. All values in pA. | Reported values are the average of five measurements from Elphy Quantum using the EBL holder's Faraday cup. All values in pA. | ||