Specific Process Knowledge/Thin film deposition/MVD: Difference between revisions
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#'''A temperature gradient''' The chemical and the line that feeds the process chamber are kept at a higher temperature. | #'''A temperature gradient''' The chemical and the line that feeds the process chamber are kept at a higher temperature. | ||
It is critical that the chemicals with the lowest vapor pressure are injected first into the process chamber. If, for instance, water is injected before FDTS, the water will flow into the FTDS expansion volume and cause polymerization, thus forcing a mechanical clean. NOT GOOD!. | It is critical that the chemicals with the lowest vapor pressure are injected first into the process chamber. If, for instance, water is injected before FDTS, the water will flow into the FTDS expansion volume and cause polymerization, thus forcing a mechanical clean. NOT GOOD!. | ||
== The FLAT recipe == | |||
The FLAT recipe is designed for coating of non-structured wafers. The amount of FDTS is delivered in one cycle (4 injections pf FDTS at 0.400 Torr + 1 injection of water at 18 Torr) and the reaction time is 15 minutes. | |||
{| border="2" cellpadding="2" cellspacing="1" | |||
|+'''The FLAT recipe''' | |||
|- | |||
! rowspan="3" align="center"| O<sub>2</sub> plasma | |||
! Flow | |||
| 200 sccm | |||
|- | |||
! Power | |||
| 250 Watts | |||
|- | |||
! Time | |||
| 300 seconds | |||
|- | |||
! rowspan="4" align="center"| Chemical # 1 (vapor order 1) | |||
! Name | |||
| FDTS | |||
|- | |||
! Line no. | |||
| 3 | |||
|- | |||
! Cycles | |||
| 4 | |||
|- | |||
! Pressure | |||
| 0.500 Torr | |||
|- | |||
! rowspan="4" align="center"| Chemical # 2 (vapor order 2) | |||
! Name | |||
| Water | |||
|- | |||
! Line no. | |||
| 1 | |||
|- | |||
! Cycles | |||
| 1 | |||
|- | |||
! Pressure | |||
| 18 Torr | |||
|- | |||
! Processing | |||
! Time | |||
| 900 seconds | |||
|- | |||
! Purge | |||
! Cycles | |||
| 5 | |||
|- | |||
|} | |||
== The FLAT recipe == | == The FLAT recipe == | ||