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Specific Process Knowledge/Etch/ICP Metal Etcher/silicon nitride: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
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{| border="2" cellspacing="2" cellpadding="3"  
{| border="2" cellspacing="2" cellpadding="3"  
!Parameter
!Parameter
!Resist mask
!A slow etch with carrier
|-
|-
|Coil Power [W]
|Coil Power [W]
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