Specific Process Knowledge/Thin film deposition/MVD: Difference between revisions
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The MVD coatings are created as self-assembled monolayers on a surface when a molecular vapor of chemials is present. | The MVD coatings are created as self-assembled monolayers on a surface when a molecular vapor of chemials is present. | ||
These chemicals, typically it is flourinated organosilanes, have a teflon-like tail consisting of -(CF<sub>2</sub>)<sub>x</sub>CF<sub>3</sub> and, in the other end, a reactive group -Si<sub>(teflon)</sub>Cl<sub>x</sub>. As shown in the figure below, the chlorine atoms react with -OH groups of the surface to form a chemical bond -Si(<sub>(teflon)</sub>)-O-Si<sub>(surface)</sub>- under elimination of HCL. This means that both Si and SiO<sub>2</sub> surfaces are coated. | These chemicals, typically it is flourinated organosilanes, have a teflon-like tail consisting of -(CF<sub>2</sub>)<sub>x</sub>CF<sub>3</sub> and, in the other end, a reactive group -Si<sub>(teflon)</sub>Cl<sub>x</sub>. As shown in the figure below, the chlorine atoms react with -OH groups of the surface to form a chemical bond -Si(<sub>(teflon)</sub>)-O-Si<sub>(surface)</sub>- under elimination of HCL. This means that both Si and SiO<sub>2</sub> surfaces are coated because of the native oxide on Si surfaces. | ||
<gallery caption="Some chemicals of the MVD and the surface reaction" widths="200px" heights="150px" perrow="2"> | <gallery caption="Some chemicals of the MVD and the surface reaction" widths="200px" heights="150px" perrow="2"> | ||
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image:MVDsurfacereaction.jpg|The chemical reaction in which the Cl atoms of the precursors are eliminated under formation of HCl. | image:MVDsurfacereaction.jpg|The chemical reaction in which the Cl atoms of the precursors are eliminated under formation of HCl. | ||
</gallery> | </gallery> | ||
== The parameters of the MVD process == | |||
The most important parameters to control during the MVD process are: | |||
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