Specific Process Knowledge/Thin film deposition/MVD: Difference between revisions

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 == Processing on the MVD ==
-The MVD coatings are created as self-assembled monolayers on a surface when a molecular vapor of chemials is present. These chemicals typically have a teflon-like tail consisting of -(CF<sub>2</sub>)<sub>x</sub>CF<sub>3</sub> and, in the other end, a reactive group -SiCl<sub>x</sub>.
+The MVD coatings are created as self-assembled monolayers on a surface when a molecular vapor of chemials is present.
-In most cases the chlorine atoms in the end of an flourinated organosilane react with -OH groups of the surface to form a chemical bond under elimination of HCL.
+These chemicals, typically it is flourinated organosilanes, have a teflon-like tail consisting of -(CF<sub>2</sub>)<sub>x</sub>CF<sub>3</sub> and, in the other end, a reactive group -SiCl<sub>x</sub>. The chlorine atoms react with -OH groups of the surface to form a chemical bond under elimination of HCL.
 <gallery caption="Some chemicals of the MVD and the surface reaction" widths="200px" heights="150px" perrow="2">