Specific Process Knowledge/Thin film deposition/MVD: Difference between revisions
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== Processing on the MVD == | == Processing on the MVD == | ||
The MVD coatings are created as self-assembled monolayers on a surface when a molecular vapor of chemials is present. These chemicals typically have a teflon-like tail consisting of -(CF<sub>2</sub>)<sub>x</sub>CF<sub>3</sub> and, in the other end, a reactive group - | The MVD coatings are created as self-assembled monolayers on a surface when a molecular vapor of chemials is present. These chemicals typically have a teflon-like tail consisting of -(CF<sub>2</sub>)<sub>x</sub>CF<sub>3</sub> and, in the other end, a reactive group -SiCl<sub>x</sub>. | ||
In most cases the chlorine atoms in the end of an flourinated organosilane react with -OH groups of the surface to form a chemical bond under elimination of HCL. | In most cases the chlorine atoms in the end of an flourinated organosilane react with -OH groups of the surface to form a chemical bond under elimination of HCL. | ||