Specific Process Knowledge/Thin film deposition/MVD: Difference between revisions
| Line 31: | Line 31: | ||
| 0.500 Torr | | 0.500 Torr | ||
|- | |- | ||
! rowspan=" | ! rowspan="4" align="center"| Chemical # 2 (vapor order 2) | ||
! Name | ! Name | ||
| Water | | Water | ||
Revision as of 16:45, 2 April 2008
The Molecular Vapor Deposition Tool
The Applied Microstructures MVD 100 system deposits molecular films on surfaces. These films serve a wide range of purposes ranging from antistiction coatings of nanoimprint lithography stamps to protecting MEMS structures. They are created as self-assembled monolayers on a surface when a molecular vapor of chemials is present. In most cases the chlorine atoms in the end of an flourinated organosilane react with -OH groups of the surface to form a chemical bond under elimination of HCL.
| O2 plasma | Flow | 200 sccm | ||
|---|---|---|---|---|
| Power | 250 Watts | |||
| Time | 300 seconds | |||
| Chemical # 1 (vapor order 1) | Name | FDTS | ||
| Line no. | 3 | |||
| Cycles | 4 | |||
| Pressure | 0.500 Torr | |||
| Chemical # 2 (vapor order 2) | Name | Water | ||
| Line no. | 1 | |||
| Cycles | 1 | |||
| Pressure | 18 Torr | |||
| Processing | Time | 900 seconds | ||
| Temperature | 10oC | SF6 Flow | 260 sccm | 0 sccm |
| No. of cycles | 31 | O2 Flow | 26 sccm | 0 sccm |