Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/ProcessD/PrD-3: Difference between revisions

From LabAdviser
← Older editNewer edit →
VisualWikitext
Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,400 edits
No edit summary
Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,400 edits
No edit summary
Line 1: Line 1:
<!--Checked for updates on 11/2-2019 - ok/jmli -->
{| border="2" cellpadding="0" cellspacing="0" style="text-align:center;"
{| border="2" cellpadding="0" cellspacing="0" style="text-align:center;"
|+ '''Process runs'''
|+ '''Process runs'''

Revision as of 12:36, 11 February 2019

Process runs
Date Substrate Information Process Information SEM Images
Wafer info Mask Material/ Exposed area Tool / Operator Conditioning Recipe Wafer ID Comments
8/1-2015 4" Wafer with travkaXX mask AZ standard Si / XX % Pegasus/jmli 10 minute TDESC clean danchip/jml/showerhead/prD/PrD-3, 150 cyc or 8:48 mins S004781 New showerhead

Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Etch/DRIE-Pegasus/showerheadchange/ProcessD/PrD-3&oldid=30826"