Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/ProcessD/NewProcessD: Difference between revisions

From LabAdviser
Jmli (talk | contribs)
No edit summary
Jmli (talk | contribs)
No edit summary
Line 1: Line 1:
<!--Checked for updates on 11/2-2019 - ok/jmli -->
{| border="2" cellpadding="0" cellspacing="0" style="text-align:center;"
{| border="2" cellpadding="0" cellspacing="0" style="text-align:center;"
|+ '''Process runs'''
|+ '''Process runs'''

Revision as of 11:36, 11 February 2019

Process runs
Date Substrate Information Process Information SEM Images
Wafer info Mask Material/ Exposed area Tool / Operator Conditioning Recipe Wafer ID Comments
15/12-2014 4" Wafer with AZ resist Travka50 pattern Si / 50 % Pegasus/jmli 20 minute TDESC clean danchip/jml/showerhead/prD/New Process D, 75 cycles or 5:00 minutes S004743 New showerhead