Specific Process Knowledge/Thin film deposition/MVD: Difference between revisions
| Line 17: | Line 17: | ||
! rowspan="3" align="center"| O<sub>2</sub> plasma | ! rowspan="3" align="center"| O<sub>2</sub> plasma | ||
! Flow | ! Flow | ||
| 200 sccm | |||
|- | |||
! Power | ! Power | ||
| 250 Watts | |||
|- | |||
! Time | ! Time | ||
| 300 seconds | | 300 seconds | ||
|- | |- | ||