Revision as of 14:43, 2 April 2008

The Molecular Vapor Deposition Tool

The Applied Microstructures MVD 100 system deposits molecular films on surfaces. These films serve a wide range of purposes ranging from antistiction coatings of nanoimprint lithography stamps to protecting MEMS structures. They are created as self-assembled monolayers on a surface when a molecular vapor of chemials is present. In most cases the chlorine atoms in the end of an flourinated organosilane react with -OH groups of the surface to form a chemical bond under elimination of HCL.

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 [[image:Mvd.jpg|200x200px|right|thumb|The MVD is located in cleanroom 1]]
-The MVD 100 system deposits molecular films on surfaces. These films serve a wide range
+The Applied Microstructures MVD 100 system deposits molecular films on surfaces. These films serve a wide range of purposes ranging from antistiction coatings of nanoimprint lithography stamps to protecting MEMS structures. They are created as self-assembled monolayers on a surface when a molecular vapor of chemials is present. In most cases the chlorine atoms in the end of an flourinated organosilane react with -OH groups of the surface to form a chemical bond under elimination of HCL.
-of purposes ranging from antistiction coatings of nanoimprint lithography stamps to protecting
-MEMS structures. They are created as self-assembled monolayers on a surface when a molecular
-vapor of chemials is present. In the case of FDTS the chlorine atoms in the end of an flourinated organosilane react with -OH groups of the surface to form a chemical bond under elimination of HCL.