Specific Process Knowledge/Etch/ICP Metal Etcher/silicon oxide: Difference between revisions
| Line 162: | Line 162: | ||
|Comments | |Comments | ||
|Sample: s007592 | |Sample: s007592 | ||
|See Martin Lind Ommen's results with hard masks in Process2share: [http://process2share.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Etch/Etching_of_SiO2] | |See Martin Lind Ommen's results with hard masks in Process2share: [http://process2share.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Etch/Etching_of_SiO2] <br> There were problems with polymer on the surface after etching. | ||
|} | |} | ||