Jump to content

Specific Process Knowledge/Etch/ICP Metal Etcher/silicon oxide: Difference between revisions

Bghe (talk | contribs)
Bghe (talk | contribs)
Line 162: Line 162:
|Comments
|Comments
|Sample: s007592
|Sample: s007592
|See more result with hard masks in Process2share: [http://process2share.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Etch/Etching_of_SiO2]
|See Martin Lind Ommen's results with hard masks in Process2share: [http://process2share.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Etch/Etching_of_SiO2]
|}
|}