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Specific Process Knowledge/Etch/ICP Metal Etcher/silicon oxide: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
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Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,317 edits
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|-style="background:Gray; color:White"
|-style="background:Gray; color:White"
!Parameter
!Parameter
!Recipe on ICP metal: A SiO2 etch with C4F8 with resist mask
!Recipe on ICP metal: A SiO2 etch with C4F8 with resist mask@20dgC
|-
|-
|Coil Power [W]
|Coil Power [W]
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