Specific Process Knowledge/Thin film deposition/Deposition of NiV: Difference between revisions
| Line 104: | Line 104: | ||
! Comment | ! Comment | ||
| Sputter target with NiV composition: Ni/V 93/7% | | *Sputter target with NiV composition: Ni/V 93/7% | ||
Substrate rotation | *Substrate rotation | ||
Substrate RF Bias (optional) | *Substrate RF Bias (optional) | ||
| Sputter target with NiV composition: Ni/V 93/7% | | *Sputter target with NiV composition: Ni/V 93/7% | ||
No substrate rotation | *No substrate rotation | ||
No substrate RF Bias | *No substrate RF Bias | ||
|- | |- | ||
|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||