Specific Process Knowledge/Thin film deposition/Deposition of NiV: Difference between revisions
| Line 96: | Line 96: | ||
* Carbon | * Carbon | ||
|-style="background:LightGrey; color:black" | |-style="background:LightGrey; color:black" | ||
! Target size | |||
| 2 inch sputter target | |||
| 6 inch sputter target | |||
|- | |||
|-style="background:WhiteSmoke; color:black" | |||
! Comment | ! Comment | ||
| Sputter target with NiV composition: Ni/V 93/7% | | Sputter target with NiV composition: Ni/V 93/7% | ||
Substrate rotation | |||
Substrate RF Bias (optional) | |||
| Sputter target with NiV composition: Ni/V 93/7% | | Sputter target with NiV composition: Ni/V 93/7% | ||
No substrate rotation | |||
No substrate RF Bias | |||
|- | |- | ||
|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||