Specific Process Knowledge/Thin film deposition: Difference between revisions
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*[[/ALD Picosun R200|ALD Picosun R200]] - Atomic layer deposition | *[[/ALD Picosun R200|ALD Picosun R200]] - Atomic layer deposition | ||
*[[/ALD2 (PEALD)|ALD (PEALD)]] - Atomic layer deposition | *[[/ALD2 (PEALD)|ALD (PEALD)]] - <span style="color:Red">(not released and page under construction)</span> Atomic layer deposition | ||
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See the [[Specific Process Knowledge/Lithography/Coaters |Lithography/Coaters]] page for coating polymers | See the [[Specific Process Knowledge/Lithography/Coaters |Lithography/Coaters]] page for coating polymers |
Revision as of 09:20, 22 December 2016
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Choose material to deposit
Dielectrica | Semicondutors | Metals | Alloys | Transparent conductive oxides | Polymers |
Silicon Nitride - and oxynitride |
Aluminium |
TiW alloy (10%/90% by weight) |
SU-8 |
Choose deposition equipment
PVD | LPCVD | PECVD | ALD | Coaters | Others
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See the Lithography/Coaters page for coating polymers |
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