Specific Process Knowledge/Etch/ICP Metal Etcher/silicon oxide: Difference between revisions
Appearance
| Line 86: | Line 86: | ||
*[[/By Peixiong|Tests done by Peixiong]] | *[[/By Peixiong|Tests done by Peixiong]] | ||
*[[/By BGHE|Tests done by Berit]] | *[[/By BGHE|Tests done by Berit]] | ||
*Test by Zhibo Li @Danchip ''dec. 2016'' - based on | *Test by Zhibo Li @Danchip ''dec. 2016'' - based on the work of Peixiong and Berit: [[:File:Zhibo Li SiO2 ICP etch (dose205).docx]] | ||
<br/> | <br/> | ||