Specific Process Knowledge/Wafer cleaning/IMEC: Difference between revisions

@@ Line 22: / Line 22: @@
 |2
 |Piranha
-|Mixture: H<math>_2</math>SO<math>_4</math>:H<math>_2</math>O<math>_2</math> (4:1)
+|Mixture: H<sub>2</sub>SO<sub>4</sub>:H<sub>2</sub>O<sub>2</sub> (4:1)
 Temp: 80 <sup>o</sup>C
 Time: 5 min
 (a yellow and a black spot)
 |Clean tank (cleanroom 4, 7-up bath for wafers) and make your own or make in dedicated glass.
-Pour up H<math>_2</math>SO<math>_4</math> first, put wafers in carrier (USE this in steps 2-7), add H<math>_2</math>O<math>_2</math>, wait 30 sec, dip wafers.
+Pour up H<sub>_2</sub>SO<sub>_4</sub> first, put wafers in carrier (USE this in steps 2-7), add H<sub>_2</sub>O<sub>_2</sub>, wait 30 sec, dip wafers.
 |Maybe clean the tank the day before!
 |-
@@ Line 56: / Line 56: @@
 |Piranha
 |Not nitride wafers!
-Mixture: H<math>_2</math>SO<math>_4</math>:H<math>_2</math>O<math>_2</math> (4:1)
+Mixture: H<sub>_2</sub>SO<sub>_4</sub>:H<sub>_2</sub>O<sub>_2</sub> (4:1)
 Temp: 80 <sup>o</sup>C
 Time: 20 min