Specific Process Knowledge/Thin film deposition/Sputter coater: Difference between revisions

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 = The Sputter coater 03 (Cressington) =
+[[image:Cressington_LA_1.jpg|300x300px|right|thumb|Sputter coater 03 (Cressington) located in the 346 basement, room 907]]
+The Sputter coater is used to sputter a thin gold layer on different small samples (smaller than 100 mm wafers). It is not allowed to use the sputter coater for other purposes.
+One of the most effective ways to counter problems with charging on non-conducting samples during SEM investigations is to apply a conducting coating to the surface. The sputter coater allows you to coat small samples with a thin gold layer. When securely grounded, i.e. connected electrically with a sample holder using aluminium tape or clamps, the gold layer will effectively eliminate all charging problems in the SEM.
+The sputter coater consists of a sputter chamber with a gold target and a stage. The stage consist of four smaller stages. These small stages can rotate individually in a planetary motion, when the entire stage rotates at the same time. The rotation speed can be controlled. Small samples can be mounted on a SEM pinstub holder (only use the smallest pinstubs) with carbon pads and then placed on one of the small stages. The maximum sample size is a 4 inch wafer. If your sample is larger than one of the four small stages, or if the sample is not fastened on a pinstub, the stage rotation should not be activated.
+The machine is controlled by a control panel. The sputter process will be done automatically, but the sputter time can be adjusted.
+Please note that the sputter rate and uniformity have not been measured yet.
+Argon is used as a sputter gas to generate a plasma in the sputter chamber and to vent the chamber.
+The Balzer sputter coater is located in the 346 basement, room 907 (next to the SEM Supra 1) .
+'''The user manual and contact information can be found in LabManager:'''
+[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=400  Sputter coater 03]
+==Process knowledge==
+*[[Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Gold|Deposition of gold]]
+==Overview of the performance of the Sputter coater 03 (Cressington) and some process related parameters==
+{| border="2" cellspacing="0" cellpadding="10"
+|-
+!style="background:silver; color:black;" align="left"|Purpose
+|style="background:LightGrey; color:black"| ||style="background:WhiteSmoke; color:black"|
+*Gold sputter coating of different samples before SEM characterization
+|-
+!style="background:silver; color:black" align="left" valign="top" rowspan="2"|Performance
+|style="background:LightGrey; color:black"|Film thickness||style="background:WhiteSmoke; color:black"|
+*Not measured.
+|-
+|style="background:LightGrey; color:black"|Deposition rate
+|style="background:WhiteSmoke; color:black"|
+*Not measured
+|-
+!style="background:silver; color:black" align="left" valign="top" rowspan="3"|Process parameter range
+|style="background:LightGrey; color:black"|Pressure||style="background:WhiteSmoke; color:black"|
+*0.01 mbar (default value)
+|-
+|style="background:LightGrey; color:black"|Current
+|style="background:WhiteSmoke; color:black"|
+*40 mA (default value)
+|-
+|style="background:LightGrey; color:black"|Sputter time
+|style="background:WhiteSmoke; color:black"|
+*Maximum 30 s
+|-
+!style="background:silver; color:black" align="left" valign="top" rowspan="2"|Substrates
+|style="background:LightGrey; color:black"|Batch size
+|style="background:WhiteSmoke; color:black"|
+*One sample smaller than a 100 mm wafer
+*Several smaller samples
+|-
+| style="background:LightGrey; color:black"|Allowed materials
+|style="background:WhiteSmoke; color:black"|
+*All samples that are allowed in the SEM Supra 1
+|-
+|-
+|}
+= The Sputter coater 04 (Agar Scientific) =
 [[image:Cressington_LA_1.jpg|300x300px|right|thumb|Sputter coater 03 (Cressington) located in the 346 basement, room 907]]